2025

Vol.32 No.1

Editorial Office

Review

  • Journal of the Microelectronics and Packaging Society
  • Volume 32(1); 2025
  • Article

Review

Journal of the Microelectronics and Packaging Society 2025;32(1):84-91. Published online: May, 15, 2025

Effect of Iron Ions (Fe2+ and Fe3+) on the Decomposition of Organic Additives during Copper Electrodeposition

  • Kyungtae Kim1,2, Min Ki Park3 , Yeunseok Ha3 , Chanyoung Jeong2,†, and Seunghoe Choe3,†
    1 Surface & Nano Materials Division, Korea Institute of Materials Science (KIMS), 797, Changwon-daero, Seongsan-gu, Changwon-si, Gyeongsangnam-do 51508, Republic of Korea 2 Department of Advanced Materials Engineering, Dong-eui University, 176, Eomgwang-ro, Busanjin-gu, Busan 47340, Republic of Korea 3 Department of Advanced Materials Engineering, Tech University of Korea, 237, Sangidaehak-ro, Siheung-si, Gyeonggi-do 15073, Republic of Korea
Corresponding author E-mail: cjeong@deu.ac.kr, schoe@tukorea.ac.kr
Abstract

In this study, the effect of iron ions on the decomposition of organic additives during copper electrodeposition was examined. When either ferrous (Fe2+) or ferric ion (Fe3+) was added to the plating bath, the decompositions of co-added additives (bis-(3-sulfopropyl)-disulfide and polyethylene glycol) were clearly retarded under both electrolytic and open-circuit conditions. The retardation of additive decomposition could be attributed to the removal of reactive species (Cu+ and Cl2) by redox reaction of Fe2+ and Fe3+. These results show that the Fe2+/Fe3+ redox couple could increase bath lifetime by inhibiting additive decomposition, even though it is Fenton’s reagent.

Keywords Copper, Electrodeposition, Organic additive, Decomposition, Ferric ion, Ferrous ion