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Vol.31 No.3

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  • Journal of the Microelectronics and Packaging Society
  • Volume 27(4); 2020
  • Article

Review

Journal of the Microelectronics and Packaging Society 2020;27(4):39-45. Published online: Feb, 17, 2021

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DOI : 10.6117/kmeps.2020.27.4.039

Rapid Fabrication of Cu/Cu2O/CuO Photoelectrodes by Rapid Thermal Annealing Technique for Efficient Water Splitting Application

  • Minjeong Lee1, Hyojung Bae2, Hokyun Rho3, Vishal Burungale2, Pratik Mane1, Chaewon Seong1, Jun-Seok Ha1,2,3,†
    1Department of Advanced Chemicals & Engineering, Chonnam National University, 2Optoelectronics Convergence Research Center, Chonnam National University, 3Energy Convergence Core Facility, Chonnam National University
Corresponding author E-mail: jsha@jnu.ac.kr
Abstract

The Cu/Cu2O/CuO photoelectrode has been successfully fabricated by Rapid Thermal Annealing technique. The structural characterization of fabricated photoelectrode was performed using X-Ray diffraction, while elemental composition of the prepared material has been checked with X-Ray Photoelectron Spectroscopy. The synthesis parameters are optimized on the basis of photoelectrochemical performance. The best photoelectrochemical performance has been observed for the Cu/Cu2O/CuO photoelectrode fabricated at 550 oC oxidation temperature and oxidation time of 50 seconds with highest photocurrent density of -3 mA/cm2 at -0.13 V vs. RHE.

Keywords Cu, Cu2O, CuO, Oxidation, Photoelectrode, Water splitting