2025

Vol.31 No.4

Editorial Office

Review

  • Journal of the Microelectronics and Packaging Society
  • Volume 31(4); 2024
  • Article

Review

Journal of the Microelectronics and Packaging Society 2024;31(4):76-82. Published online: Jan, 22, 2025

Comparison of Through Glass Via Machining Geometry and Mechanical Properties Using Single Mode and Burst Mode of Femtosecond Laser

  • LeeJaebeom1,2, ParkJiyong1,3,†
    1Advanced Packaging Integration Center (APIC), Korea Institute of Industrial Technology (KITECH), Incheon, Republic of Korea 2Department of Mechanical Engineering, Hanyang University, Seoul, Republic of Korea 3Department of Convergence Manufacturing System Engineering, Korea National University of Science and Technology (UST), Daejeon, Republic of Korea
Corresponding author E-mail: j.park@kitech.re.kr
Abstract

Recently, there has been a lot of research into glass as a material for interposer substrates used in 2.5D packaging technologies. Femtosecond lasers have been widely used to form TGV (through glass via) structures on glass interposers. However, damage caused by thermoelastic waves and shock waves during the TGV fabrication process using femtosecond lasers can limit the formation of vias with fine pitch, making it crucial to minimize damage during processing the damage caused by thermoelastic and shock waves during the processing of TGVs with femtosecond lasers is a challenge in forming closely spaced vias. In this study, we propose to reduce the via spacing while suppressing the damage caused by the single mode to the around of the via by using the burst mode in which the single pulse of the femtosecond laser is distributed and oscillated, and to analyze the mechanical properties around the via processed by single mode and burst mode through nanoindenter to suggest that the reason for the damage is related to the elastic modulus.

Keywords Femtosecond laser, Through glass via, Burst mode, Fine pitch

REFERENCES
  • H. J. Kim, J. P. Jung, Artificial Intelligence Semiconductor and Packaging Technology Trend, J. Microelectron. Packag., 30 (2023)
  • E.-C. Noh, H.-W. Lee, J.-W. Yoon, Recent Advances in Fine Pitch Cu Pillar Bumps for Advanced Semiconductor Packaging, J. Microelectron. Packag. Soc., 30 (2023)
  • M.-K Cho, J.-K. Cho, K.-M. Kim, S. Y. Kim, D.-G. Han, T.-H. Sung, Development Trend of Ni-less Surface Treatment Technology for Semiconductor Packaging Substrates, J. Microelectron. Packag. Soc., 30 (2023)
  • R. Tummala, N. Nedumthakady, S. Ravichandran, B. Deprospo, V. Sundaram, , Heterogeneous and homogeneous package integration technologies at device and system levels, (2018)
  • Y. H. Lin, , Multilayer RDL interposer for heterogeneous device and module integration, (2019)
  • B. Sawyer, , Modeling, design, fabrication and characterization of first large 2.5D glass interposer as a superior alternative to silicon and organic interposers at 50 micron bump pitch, (2014)
  • V. Sukumaran, T. Bandyopadhyay, V. Sundaram, R. Tummala, Low-Cost Thin Glass Interposers as a Superior Alternative to Silicon and Organic Interposers for Packaging of 3-D ICs, IEEE Transactions on Components, Packaging and Manufacturing Technology, 2 (2012)
  • A. Usman, Interposer Technologies for High-Performance Applications, IEEE Trans. Components, Packag. Manuf. Technol., 7 (2017)
  • K. Kolari, V. Saarela, S. Franssila, Deep plasma etching of glass for fluidic devices with different mask materials, J. Micromech. Microeng., 18 (2008)
  • S. Takahashi, K. Horiuchi, K. Tatsukoshi, M. Ono, N. Imajo, T. Mobely, , Development of Through Glass Via (TGV) Formation Technology Using Electrical Discharging for 2 . 5 / 3D Integrated Packaging, (2013)
  • P. R. Herman, A. Oettl, K. P. Chen, R. S. Marjoribanks, , Laser micromachining of transparent fused silica with 1-ps pulses and pulse trains, 3616 (1999)
  • N. Zhang, X. Zhu, J. Yang, X. Wang, M. Wang, Timeresolved shadowgraphs of material ejection in intense femtosecond laser ablation of aluminum, Phys. Rev. Lett., 99 (2007)
  • Y. Ito, Mechanisms of damage formation in glass in the process of femtosecond laser drilling, Appl. Phys. A Mater. Sci. Process., 124 (2018)
  • L. V. Keldysh, Ionization in the Field of a Strong Electro-magnetic Wave, Sel. Pap. Leonid V Keldysh, 20 (2023)
  • C. B. Schaffer, A. Brodeur, E. Mazur, Laser-induced breakdown and damage in bulk transparent materials induced by tightly focused femtosecond laser pulses, Meas. Sci. Technol., 12 (2001)
  • S. C. Wilks, W. L. Kruer, Absorption of ultrashort, ultra-intense laser light by solids and overdense plasmas, IEEE J. Quantum Electron., 33 (1997)
  • X. Liu, D. Du, G. Mourou, Laser ablation and micromachining with ultrashort laser pulses, IEEE J. Quantum Electron., 33 (1997)
  • B. Neuenschwander, T. Kramer, B. Lauer, B. Jaeggi, , Burst mode with ps- and fs-pulses: Influence on the removal rate, surface quality, and heat accumulation, 9350 (2015)
  • H. Le, T. Karkantonis, V. Nasrollahi, P. Penchev, S. Dimov, MHz burst mode processing as a tool for achieving removal rates scalability in ultrashort laser micro-machining, Appl. Phys. A Mater. Sci. Process., 128 (2022)
  • S. M. Eaton, Transition from thermal diffusion to heat accumulation in high repetition rate femtosecond laser writing of buried optical waveguides, Opt. Express, 16 (2008)
  • D. Esser, S. Rezaei, J. Li, P. R. Herman, J. Gottmann, Time dynamics of burst-train filamentation assisted femtosecond laser machining in glasses, Opt. Express, 19 (2011)
  • J. Lopez, Percussion drilling in glasses and process dynamics with femtosecond laser GHz-burst, Opt. Express, 30 (2022)
  • H. Hu, X. Wang, H. Zhai, High-fluence femtosecond laser ablation of silica glass: Effects of laser-induced pressure, J. Phys. D. Appl. Phys., 44 (2011)
  • A. Ben-Yakar, R. L. Byer, Femtosecond laser ablation properties of borosilicate glass, J. Appl. Phys., 96 (2004)
  • P. Balage, Comparative Study ofPercussion Drilling in Glasses with a Femtosecond Laser in Single Pulse, MHz-Burst, and GHz-Burst Regimes and Optimization of the Hole Aspect Ratio, Micromachines, 14 (2023)